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ARQUIVO DE ACRÔNIMOS: ABREVIATURAS
Como o número de ACRÔNIMOS ["palavra formada pela primeira letra (ou mais de uma) de cada uma das partes sucessivas de uma locução, ou pela maioria dessas partes"] que figura na literatura científica - especialmente na de Química -, cresce à cada dia, o WebSite LQES coloca à disposição o ARQUIVO DE ACRÔNIMOS LQES.
Várias fontes foram cotejadas (veja referências após a letra Z) para constituir a versão 1.0, que receberá acréscimos à medida em que novas informações forem coletadas e/ou recebidas.
Para consultar o significado de um determinado Acrônimo, bastar clicar na letra correspondente à sua inicial.
Caso você não encontre o significado do Acrônimo nesta lista, visite a rubrica LQES Cultural/Links Selecionados/Dicionários
Maria Isolete Alves, Managing Editor
| A - voltar |
| AAS |
Atomic absorption spectroscopy |
| ACF |
Anisotropic conductive film |
| ADES |
Angle dispersed electron spectroscopy |
| AEM |
Analytical electron microscopy, |
| AES |
Auger electron spectroscopy |
| AES |
Atomic emission spectroscopy |
| AF |
Antiferromagnetic |
| AFM |
Atomic force microscopy |
| ALD |
Atomic layer deposition |
| ALE |
Atomic layer epitaxy |
| ALP |
Atomic layer processing |
| AME |
Angle-measuring equipment |
|
AP
|
Atom probe (analyzer) |
| AP-CVD |
Atomic probe (analyzer); atomic property; annealing point; ammonium perchlorate |
| APS |
Appearance potential spectroscopy |
| AREM |
Atomic resolution electron microscopy |
| ARM |
Atomic resolution microscopy |
| ARP |
Angle resolved photoemission |
| ARPS |
Angle-resolved photoemission spectroscopy |
| ARUPS |
Angle-resolved ultraviolet photoelectron XPS |
| ARXPS |
Angle-resolved XPS |
| ASIC |
Application-specific integrated circuit |
| B - voltar |
| b.c.c. |
Body-centered cubic |
| b.c.t. |
Body-centered tetragonal |
| BE |
Backscattered electron |
| BET |
Brunauer-Emmett-Teller |
| BF |
Bright field |
|
BLE
|
Bombardment-induced light emission |
| BOD |
Biological oxygen demand |
| BOF |
Basic oxygen furnace |
| BOP |
Basic oxygen process |
| BPC |
Bonded phase chromatography |
|
BSE
|
Backscattered electrons |
| BTE |
Boltzmann transport equation |
| BW |
Bandwidth |
|
BZ
|
Brillouin zone |
| C - voltar |
| CAIBE |
Chemically assisted ion beam etching |
| CARS |
Coherent anti-stokes Raman scattering
|
| CAS |
Chemical Abstracts Service
|
| CB |
Conduction band
|
|
CBD
|
Convergent beam diffraction
|
| CBE |
Chemical beam epitaxy |
|
CBED
|
Convergent beam electron diffraction
|
| CBIM |
Convergent-beam imaging microscopy |
| CC |
Cluster center |
|
CCD
|
Charge-coupled device
|
| c.c.p. |
Cubic close-packed |
| CD |
Climb dislocation; compact disk; critical dimensions; circular dichroism; cross direction
|
| CD-ROM |
Compact disk, read-only memory |
|
CDW
|
Charge density wave
|
|
CE
|
Cluster expansion (technique); conductive elastomer; carbon equivalent; current efficiency
|
|
CEMS
|
Conversion electron Mössbauer spectroscopy
|
| CHF |
Critical heat flux |
| CHM |
Chemical machining |
|
CI
|
Chemical ionization
|
| CIS |
Constant initial state spectroscopy |
| CIS |
Complex impedance spectroscopy |
| CITS |
Current imaging tunneling spectroscopy |
| Cl |
Cathodoluminescence |
| CMA |
Cylindrical mirror analyzer |
| CMC |
Ceramic matrix composites |
| CMOS |
Complementary metal-oxide semiconductor |
| CMR |
Contact microradiography |
| CMT |
Cadmium mercury telluride |
| COD |
Chemical oxygen demand; crack opening displacement |
| CPAA |
Charged particle activation analysis |
| CRT |
Cathode ray tube |
| CS |
Chemisorption |
| CSRS |
Coherent stokes Raman spectroscopy |
| CTE |
Coefficient of thermal expansion |
| CTEM |
Conventional transmission electron microscopy |
| CTEM |
Conventional TEM (=TEM) |
| CTF |
Contrast transfer function |
| CTL |
Charge transport layer |
| CV |
Capacitance-voltage; Charpy Vnotch; coefficient of variation |
| C-V |
Current-voltage |
| CVD |
Chemical vapour deposition |
| CVT |
Chemical vapor transport |
|
CW
|
Continuous wave
|
| D - voltar |
| DAC |
Diamond anvil cell |
| DENS |
Diffuse elastic neutron scattering |
|
DBM
|
Direct bombardment mod |
| DF |
Dark field |
| DFZ |
Defect-free zone |
| DLTS |
Deep-level transient spectroscopy |
| DME |
Dropping mercury electrode |
| DMS |
Desorption mass spectroscopy |
| DOF |
Depth of field |
| DOM |
Dissolved organic matter |
| DOC |
Density states |
| DQC |
Decagonal quasicrystal |
| DRAM |
Dynamic random access memory |
| DSA |
Dimensionally stable anode |
| DSC |
Differential scanning calorimetry |
| DTA |
Differential thermal analysis |
| DRX |
X-ray diffractometry |
|
DXRD
|
Dynamic X-ray diffraction |
| E - voltar |
| E-2E |
Electron coincidence spectroscopies |
|
EB-PVD
|
Electron beam; extrudable |
|
EB
|
Electron beam physical vapor deposition |
|
EBIC
|
Electron beam induced conductivity |
|
EB-PVD
|
Electron beam; extrudable |
| EBSP |
Electron backscattered spectroscopy |
| ECL |
Electrogenerated chemiluminescence |
| ECP |
Electron channeling pattern |
| ECR |
Electron cyclotron resonance |
| ED |
Electrodeposition |
| EDAX |
Energy dispersive X-ray analysis (Veja EDX) |
| EDC |
Energy-distribution curve |
| EDS |
Energy-dispersive X-ray spectrometry (Veja EDX) |
| EDX |
Energy-dispersive X-ray spectroscopy (Também EDS ou EDXS) |
| EELS |
Electron energy loss spectroscopy |
| EEM |
Emission electron microscopy |
| EEM |
Emission electron microscopy |
| EFM |
Electrical force microscopy |
| EG |
Electron gas; electrogalvanized; ethylene glycol |
| EHP |
Electron-hole pair |
| EI |
Electron impact |
| EID |
Electron-induced desorption |
| ELNES |
Energy-loss near-edge structure |
| ELS |
Electron energy loss spectroscopy |
| EM |
Emulsions; electromodulation |
| EMA |
Electron micropobe analysis; ethylene-methyl acrylate |
| EMAT |
Electromagnetic-acoustic transducer |
| EMF |
Electromotive force |
| EMI |
Electromagnetic interference |
| EMR |
Electromagnetic radiation |
| EOT |
Electrical oxide thickness |
| EPC |
Electropowder coating |
| EPMA |
Electron probe microanalysis |
|
EPR
|
Electron paramagnetic resonance |
| ERS |
Enhanced Raman-spectroscopy |
| ESCA |
Electron spectroscopy for chemical analysis (Veja XPS) |
| ESD(MS) |
Electron stimulated desorption mass spectroscopy |
| ESR |
Electron spin resonance |
| EXAFS |
Extended (X-ray) absorption fine structure |
|
EXELFS
|
Extended (electron) energy loss fine structure |
| F - voltar |
| FAB |
Fast atom bombardment |
|
FAB(MS)
|
Fast atom bombardment mass spectroscopy |
| f.c.c. |
Face-centered cubic |
| FCG |
Fatigue crack growth
|
| FCP |
Fatigue crack propagation |
| f.c.t. |
Face-centered tetragonal |
| FDMS |
Field desorption mass spectroscopy |
| FED |
Field emission device |
| FEED |
Field emission energy distributions |
| FEG |
Field emission gun |
| FEM |
Field emission microscopy |
| FES |
Field-effect spectroscopy |
| FG |
Fiberglass |
| FIM |
Field ion microscopy |
| FIMS |
Field ionization mass spectroscopy |
| FLn |
Fully lamellar, narrow (spacing) |
| FLw |
Fully lamellar, wide (spacing) |
| FM |
Ferromagnetic |
| FMCW |
Frequency-modulated continuous wave |
| FOM |
Figure of merit |
| FT |
Phase transformation |
| FTICR |
Fourier transform ion cyclotron resonance (Também FTMS) |
| FTIR |
Fourier transform infrared spectroscopy |
|
FTMS
|
Fourier transform mass spectrometer (Também FTICR) |
|
FWHM
|
Full width at half maximum |
| G - voltar |
|
GA
|
Gas atomization |
|
GB
|
(gain) x (band-width) (product); grain boundary |
| GDMS |
Glow discharge mass spectroscopy |
|
GLC
|
Gas-liquid chromatography |
|
GMR
|
Giant magnetoresistance |
| GPC |
Gel permeation chromatography |
|
GR
|
Graphite |
| GS |
Ground state |
| GSC |
Gas solid chromatography |
|
GSMBE
|
Gas source MBE |
| H - voltar |
| HBT |
Hetero-junction bipolar transistor |
| HDP |
High-density plasma
|
| HEED |
High-energy electron diffraction
|
| HEIS |
High energy ion scattering (Veja RBS) |
| HEL |
High-energy laser |
| HEM |
Heat exchange method
|
|
HLW
|
High-level (radioactive) waste
|
|
HMW
|
High molecular weight
|
|
HOMO
|
Highest occupied molecular orbital
|
|
HOMO-LUMO
|
Highest occupied molecular orbital- lowest unoccupied molecular orbital
|
|
HOLZ
|
Higher order laue zone |
| HPHT |
High-pressure/high-temperature (technique) |
|
HPLC
|
High-pressure liquid chromatography
|
|
HPMV
|
High-pressure mercury vapor (lamp)
|
|
HREM
|
High-resolution electron microscopy |
| HPT |
Heterojunction phototransistor |
|
HRELS
|
High-resolution energy-loss spectroscopy
|
|
HRS
|
High-resolution spectrometer
|
|
HRSEM
|
High-resolution SEM
|
|
HRTEM
|
High-resolution TEM
|
| HSA |
Hemispherical analyzer |
| HSLC |
High-speed liquid chromatography |
|
HTS
|
High-temperature sputtering; high temperature
superconductor
|
|
HTSEC
|
High-temperature size-exclusion chromatography
|
|
HV
|
High vacuum (valve)
|
|
HVEM
|
High voltage electron microscopy |
| I - voltar |
| IAES |
Ion induced Auger electron spectroscopy |
| I/O |
Input/output |
|
IBAD
|
Ion-beam-assisted deposition
|
|
IBAE
|
Ion-beam-assisted etching
|
|
IBSD
|
Ion beam sputter deposition
|
|
IC
|
Integrated circuit
|
|
ICP
|
Inductively coupled plasma |
|
ICPMS
|
Inductively coupled plasma mass spectroscopy |
| IDOS |
Integrated density of states |
|
IE
|
Imaging ellipsometry
|
| IETS |
Inelastic electron tunneling spectroscopy |
| IGFET |
Insulated-gate field-effect transistor |
|
IILE
|
Ion-induced light emission
|
|
IMP(A)
|
Ion microprobe analysis |
| INS |
Ion neutralization spectroscopy |
| IPE |
Inverse photo emission |
| IPL |
Ion projection lithography |
| IPS |
Inverse photoemission |
| IQC |
Icosahedral quasicrystal |
|
IR
|
Induced radioactivity; infrared
|
|
IRED
|
Infrared emitting diode
|
| ISS |
Ion scattering spectroscopy |
| IUPAC |
International union for pure and applied chemistry |
| IV |
Intermediate valence
|
|
I-V
|
Current (I)-voltage(V)
|
| k - voltar |
| KMC |
Kinetic Monte Carlo (simulations) |
| Kossel |
Diffraction of electron-excited X-rays |
| L - voltar |
| L |
Langmuir (unit of gas dose) |
| LACVD |
Laser-assisted CVD
|
| LALLS |
Low-angle laser-light scattering
|
| LAMMA |
Laser microprobe mass analysis |
|
LAXS
|
Low angle X-ray scattering |
| LC |
Liquid chromatography |
| LCAO |
Linear combination of atomic orbitals
|
| LCD |
Liquid crystal display
|
|
LDMS
|
Laser desorption mass spectroscopy |
| LDOS |
Local density of states |
| LED |
Light-emitting diode
|
| LEED |
Low energy electron diffraction |
| LEELS |
Low energy electron loss spectroscopy |
| LEEM |
Low energy electron microscopy |
| LEIS |
Low energy ion (back) scattering |
| LET |
Linear energy transfer |
| LFM |
Lateral force microscopy
|
| LIMA |
Laser induced ion mass analysis |
| LIMS |
Laser ionization mass spectroscopy |
| LLC |
Liquid-liquid chromatography |
| LLW |
Low-level (radioactive) waste
|
| LMW |
Low molecular weight
|
| LNG |
Liquefied natural gas
|
| LNT |
Liquid nitrogen temperature
|
| LOX |
Liquid oxygen
|
| LPCVD |
Low-pressure chemical vapor deposition
|
| LPG |
Liquefied petroleum gas
|
| LPS |
Laser plasma source |
| LSC |
Liquid-solid chromatography |
| LVM |
Local vibration mode
|
| M - voltar |
| MBE |
Molecular beam epitaxy |
| MBMS |
Molecular beam mass spectroscopy |
| MCD |
Magnetic circular dichroism
|
| MCVD |
Modified chemical vapor deposition
|
| ME |
Microellipsometry
|
| MFM |
Magnetic force microscopy
|
| MIM |
Metal-isolator-metal
|
|
MIR-IR
|
Multiple internal reflectance infrared spectroscopy
|
| ML |
Monolayer; mega-Langmuir
|
| MLC |
Multilayer capacitor; multilayer ceramic
|
|
MMC
|
Metal matrix composites |
|
MMR
|
Magnetically modulated microwave reflection |
| MOCVD |
Metallorganic chemical vapor deposition |
| MOD |
Metallorganic decomposition |
| MOLE |
Molecular optical laser examiner
|
| MO-MBE |
Metallo-organic MBE |
| MOS |
Metal-oxide-semiconductor
|
| MOSFET |
Metal-oxide-semiconductor field effect transistor
|
| MQW |
Multiple quantum well
|
| MR |
Magnetoresistance
|
| MS |
Mass spectroscopy |
| MSANS |
Multiple small angle neutron scattering |
|
MULSAM
|
Multispectral auger microscope |
| MW |
Molecular weight |
| MWCVD |
Microwave-plasma CVD
|
|
MXPS
|
Monochromatized x-ray photoelectron spectroscopy
|
| N - voltar |
| NAA |
Neutron activation analysis |
|
NCEM
|
National Center for Electron Microscopy (Berkeley, CA) |
| ND |
Neutron diffraction |
| NDT |
Non-destructive testing |
| NHE |
Normal hydrogen electrode |
| NI |
Nanoindentation |
| NIS |
Neutron inelastic scattering |
| NIST |
National Institute of Standards and Technology (Antes: National Bureau of Standards) |
| NLO |
Nonlinear optical |
| NMR |
Nuclear Magnetic Resonance |
| NQR |
Nuclear quadrupole resonance spectroscopy |
| NSOM |
Near-field scanning optical microscopy |
| NTM |
Non-transition metal |
| O - voltar |
| OB |
Occupied band |
| OE |
Optical emission
|
| OEIC |
Opto-electronic integrated circuit
|
| OLED |
Organic light-emitting diode
|
| OM |
Optical microscopy |
| OMVPE |
Organometallic vapor-phase epitaxy
|
| P - voltar |
| PA |
Plasma arc |
| PACE |
Plasma-assisted chemical etching |
| PACVD |
Plasma-assisted CVD |
| PAM |
Photo acoustic microscopy |
| PAS |
Photoacoustic spectroscopy; positron annihilation spectroscopy |
| PBG |
Photonic band gap
|
| PC |
Photonic crystal; polycarbonate
|
| PCM |
Phase change material; point-charge model
|
| PCVD |
Plasma-assisted chemical vapor deposition
|
| PD |
Phase diagram; photodetector; plasma doping
|
| PDA |
Photodiode array
|
| PDOS |
Phonon density of states |
|
PDS
|
Photothermal deflection spectroscopy |
| PECVD |
Plasma-enhance CVD |
| PEEM |
Photo emission electron microscopy |
| PEM |
Plastic encapsulated microcircuit |
| PES |
Photoelectron spectroscopy |
| PESM |
Photo electron spectro microscopy |
| PET |
Positron emission tomagraphy; pentaerythritol; poly(ethylene terephthalato) |
| PEYS |
Photo electron yield spectroscopy
|
| PGC |
Pirolysis gas chromatography |
| PIXE |
Particle induced X-ray emission |
| PL |
Photolominescence |
| PLAD |
Pulsed laser ablation deposition |
| PLD |
Pulsed laser deposition |
| PLZT |
Lead lanthanum zirconate titanate |
| PMR |
Proton magnetic resonance |
| PMT |
Photomultiplier tube; polymethylpentene |
| PN |
Periodic number |
| PODSA |
Position sensitive atom probe |
| ppm |
Parts per million |
| PSD |
Position sensitive detector |
| PSD(MS) |
Photon stimulated desorption mass spectroscopy |
| PSZ |
Partially stabilized zirconia |
|
PTCR
|
Positive temperature coefficient for resistance |
|
PVD
|
Physical vapour deposition |
| Q - voltar |
| QC |
Quasicrystalline; quasicrystal |
| QD |
Quatum dot
|
| QENS |
Quasielastic neutron scattering
|
| QMS |
Quadrupole mass spectroscopy
|
|
QN
|
Quantum number
|
| QW |
Quantum well
|
| R - voltar |
| RAE |
Resistive anode encoder |
| RAM |
Random-access memory |
| RAP |
Reactive atmosphere processing |
|
RBS
|
Rutherford backscattering spectroscopy (Também HEIS) |
| RCE |
Rotating compensator ellipsometer |
| RDF |
Radial distribution function
|
| RDS |
Rate determining step; reflection difference spectroscopy
|
| RED |
Reflection electron diffraction |
| REM |
Reflection electron microscopy |
| REMPI |
Resonantly-enhanced multi-photon ionization |
| REP |
Rotating electrode process |
| RF |
Radiofrequency
|
| RGA |
Residual gas analyzer
|
| RH |
Relative humidity
|
| RHE |
Reversible hydrogen electrode
|
| RHEED |
Reflection high energy electron diffraction |
| RIE |
Reactive ion etching |
| RIR |
Reference intensity ratios |
| RMS |
Root mean square |
|
RSF
|
Relative sensitivity factor |
| RT |
Time real; room temperature |
| RTA |
Rapid thermal annealing
|
|
RTE
|
Real time ellipsometry
|
|
RTP
|
Rapid thermal processing
|
|
RTPCVD
|
Rapid thermal processing CVD
|
| S - voltar |
| SACP |
Selected area channeling pattern |
|
SAD
|
Selected area diffraction |
| SALI |
Surface analysis by laser ionization |
| SAM |
Scanning Auger microscopy |
| SANS |
Small angle neutron scattering |
| SAXS |
Small angle X-ray scattering |
| SBM |
Separate bombardment mode |
| SE |
Secondary electron |
| SEAM |
Scanning electron acoustic microscopy |
| SEM |
Scanning electron microscopy |
| SERS |
Surface enhanced Raman scattering |
| SEXAFS |
Surface EXAFS or Synchrotron EXAFS |
| SHEED |
Scanning high energy electron diffraction |
| SIIMS |
Secondary ion imaging mass spectroscopy |
| SIMS |
Secondary ion mass spectroscopy |
| SIPS |
Sputter induced photon spectroscopy |
| SLAM |
Scanning laser acoustic microscopy |
| SNMS |
Sputter neutral mass spectroscopy |
| SNOM |
Scanning nearfield optical microscopy |
| SOM |
Scanning optical microscopy |
| SOMSEM |
SOM in SEM |
| SPAM |
Scanning photo acoustic microscopy |
| STEM |
Scanning transmission electron microscopy |
| STM |
Scanning tunneling microscopy |
| STS |
Scanning tunneling spectroscopy |
| STXM |
Scanning transmission X-ray microscopy |
| SXE |
Soft X-ray emission |
|
SXM
|
Scanning X-ray microscopy |
| T - voltar |
| TCP |
Transmission channeling pattern |
|
TD
|
Theoretical density |
| TEM |
Transmission electron microscopy |
| TGA |
Thermogravimetric analysis |
| TL |
Thermoluminescence |
| TMA |
Thermomechanical analysis |
| TMS |
Tetramethylsilane |
| TOF |
Time of flight |
| TRSS |
Time-resolved Raman spectroscopy |
|
TXRF
|
Total reflection X-Ray fluorescence |
| U - voltar |
| UPS |
Ultraviolet photoelectron spectroscopy |
|
UTW
|
Ultra thin window (detector) |
| V - voltar |
| VUV |
Vacuum ultraviolet |
| W - voltar |
| WDS |
Veja WDX |
|
WDX
|
Wavelength dispersive X-ray spectrometry (Também WDS) |
|
WF
|
Work function |
| X - voltar |
| XAFS |
X-ray absorption spectroscopy |
| XANES |
X-ray absorption near edge structure |
|
XPS
|
X-ray photoelectron spectroscopy |
| XRD |
X-ray diffraction |
| XRF |
X-ray fluorescence |
|
XRM
|
X-ray microscopy |
| Z - voltar |
| ZAF |
Atomic number, absorption and fluorescence corrections pattern |
Fontes:
- W.S. Young, G.L. McVay and G.E. Pike (eds.), Ceramic Transactions, vol.5, Advanced Characterization Techniques for Ceramics, American Ceramic Society, Westerville, (1988).
- P.J. Goodhew and J.E. Castle, Institute of Physics EMAG, 515, (1983).
- P.E.J. Flewitt and R.K. Wild, "Physical Metods for Materials Chraracterisation", Institute of Physics Publishing, Bristol, (1994).
- Bushow, K.H.J. et al., "Encyclopedia of Materials: Science and Technology", Elsevier Science Ltd., Oxford, (2001).
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